DynaTex GST 150 Manufacturer:DynaTex Condition:Used,we sell it at AS IS. Price:Best Offer PRODUCT BENEFITS ? More real estate and narrower street widths, because Zero kerf loss allows higher die density on the wafer ? Increased production rates ? Chip free results ? Less residual stress ? No toxic water discharge ? No D.I. water costs PRODUCT FEATURES Automatic...">

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              Home > Electronic, IT & Office Equipment > Electronic Manufacturing Machinery > Backside Equipment DynaTex GST 150
              Global Nanotech Equipment Co.
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              Backside Equipment DynaTex GST 150
              Backside Equipment > DynaTex GST 150
              Manufacturer:DynaTex
              Condition:Used,we sell it at AS IS.
              Price:Best Offer

              PRODUCT BENEFITS
              ? More real estate and narrower street widths,
              because Zero kerf loss allows higher die
              density on the wafer
              ? Increased production rates
              ? Chip free results
              ? Less residual stress
              ? No toxic water discharge
              ? No D.I. water costs
              PRODUCT FEATURES
              Automatic
              ? Capable of completely and automatically
              scribing and breaking many substrate
              materials.
              Cost effective
              ? Reduced production time
              ? System integration allows easy hook-up and
              transport
              ? Superior yields and improved efficiency
              Environmental
              ? No D.I. or toxic wastewater
              Versatile
              ? Fully programmable for all scribing and
              breaking parameters, including TrueAngle?
              diamond tool positioning
              ? Infinitely programmable with Pentium?
              powered Windows? interface
              Easy
              ? Stored Process eliminates operator
              adjustments when changing between wafer
              types
              GST-150 SPECIFICATIONS
              Wafer Size: 150mm max. (6" max.)
              Wafer Thickness: 40 um to 1725 um (material
              dependant)
              Minimum Die Size: 200 um square (dependent
              on type of material and wafer thickness)
              Minimum Wafer Index: 5 um with Std.
              Encoders; 2 um with Optional Hi-Res.
              Encoders
              Maximum Wafer Index: 150 mm
              Maximum Backside Metal: 10 um (dependent
              on type of material and process)
              Scribe Channel Width: < 5 um
              Load Time: < 15 seconds
              Alignment Time: < 30 seconds
              Scribe Speed: 2 mm/sec to 100mm/sec
              (0.080"/sec to 4 "/sec) (dependent on type of
              material and process)
              Break Rate: 2 breaks/sec. (depending on
              substrate thickness and backside metals)
              Break Method: Patented impulse bar
              Vision System: Digital Hi-Res BW/Color
              Camera; 17" Color Monitor; Pattern
              Recognition System for Auto Alignment, Edge
              Detection for automatic bar and piece
              alignment, and Auto Step-Correction
              Programmable: Scribe Tool Life; Scribe Angle;
              Scribe Approach Speed; Scribe Force; Scribe
              Speed; Scribe Extension; Break Force; Multiple
              Die Size; Fiducial Image Storage; Wafer Type
              and Profile; Multiple Wafer Profile Storage.
              (Profile programmable in metric or imperial
              units)
              Wafer Mounting:Std: Metal Saw Frames (FF-
              105 and FF-108); Optional: 7" or 6" Hoop Sets
              (limits max. wafer size to 4" and 3")
              Substrates: Saphire, GaAs, LiNbO3, Glass, InP,
              GaP, Silicon, Quartz

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